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Chemical mechanical polishing of manganese (Mn)-based barrier films in the BEOL interconnects for advanced metallization nodes

dc.contributor.authorSagi, Kaushik
dc.contributor.authorBabu, S.V.
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorStruyf, Herbert
dc.contributor.authorTeugels, Lieve
dc.date.accessioned2021-10-23T14:29:23Z
dc.date.available2021-10-23T14:29:23Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27253
dc.sourceIIOimport
dc.titleChemical mechanical polishing of manganese (Mn)-based barrier films in the BEOL interconnects for advanced metallization nodes
dc.typeMeeting abstract
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage147
dc.source.endpage148
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access
imec.internalnotespaper PMT-10


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