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Evaluation of optical material parameters for advanced absorbers on EUV masks

dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorEdrisi, Arash
dc.contributor.authorvan de Kruijs, Robbert
dc.date.accessioned2021-10-23T14:43:10Z
dc.date.available2021-10-23T14:43:10Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27284
dc.sourceIIOimport
dc.titleEvaluation of optical material parameters for advanced absorbers on EUV masks
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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