Wet selective SiGe etch to enable Ge nanowire formation.

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Authors
Sebaai, Farid; Witters, Liesbeth; Holsteyns, Frank; Wostyn, Kurt; Rip, Jens; Yukifumi, Yoshida; Lieten, Ruben; Bilodeau, Steven; Cooper, Emanuel
Conference
Ultra Clean Processing of Semiconductor Surfaces XIII - UCPSS
Title
Wet selective SiGe etch to enable Ge nanowire formation.
Publication type
Proceedings paper
Embargo date
9999-12-31
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