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Study of electrically active defects in epitaxial layers on silicon

dc.contributor.authorSimoen, Eddy
dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorGupta, Somya
dc.contributor.authorGencarelli, Federica
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.contributor.authorRosseel, Erik
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorLanger, Robert
dc.contributor.authorBarla, Kathy
dc.contributor.authorVrielinck, Henk
dc.contributor.authorLauwaert, Johan
dc.date.accessioned2021-10-23T14:56:17Z
dc.date.available2021-10-23T14:56:17Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27314
dc.sourceIIOimport
dc.titleStudy of electrically active defects in epitaxial layers on silicon
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.source.peerreviewyes
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC Symposium IV: Thin Film and Process Integration
dc.source.conferencedate13/03/2016
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec
imec.internalnotesJoint Session with Symposium VI: Materials and Process Integration for Device and Interconnection


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