dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Dhayalan, Sathish Kumar | |
dc.contributor.author | Jayachandran, Suseendran | |
dc.contributor.author | Gupta, Somya | |
dc.contributor.author | Gencarelli, Federica | |
dc.contributor.author | Hikavyy, Andriy | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Rosseel, Erik | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Langer, Robert | |
dc.contributor.author | Barla, Kathy | |
dc.contributor.author | Vrielinck, Henk | |
dc.contributor.author | Lauwaert, Johan | |
dc.date.accessioned | 2021-10-23T14:56:17Z | |
dc.date.available | 2021-10-23T14:56:17Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27314 | |
dc.source | IIOimport | |
dc.title | Study of electrically active defects in epitaxial layers on silicon | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Jayachandran, Suseendran | |
dc.contributor.imecauthor | Hikavyy, Andriy | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Rosseel, Erik | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.imecauthor | Langer, Robert | |
dc.contributor.imecauthor | Barla, Kathy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Hikavyy, Andriy::0000-0002-8201-075X | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.contributor.orcidimec | Langer, Robert::0000-0002-1132-3468 | |
dc.source.peerreview | yes | |
dc.source.conference | China Semiconductor Technology International Conference - CSTIC Symposium IV: Thin Film and Process Integration | |
dc.source.conferencedate | 13/03/2016 | |
dc.source.conferencelocation | Shanghai China | |
imec.availability | Published - imec | |
imec.internalnotes | Joint Session with Symposium VI: Materials and Process Integration for Device and Interconnection | |