Metal oxide EUV photoresist performance for N7 relevant patterns and processes

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Authors
Stowers, Jason; Anderson, Jeremy; Cardineau, Brian; Clark, Benjamin; De Schepper, Peter; Edson, Joseph; Greer, Michael; Jiang, Kai; Kocsis, Michael; Meyers, Stephen; Telecky, Alan; Grenville, Andrew; De Simone, Danilo; Gillijns, Werner; Vandenberghe, Geert
Conference
Advances in Patterning Materials and Processes XXXIII
Title
Metal oxide EUV photoresist performance for N7 relevant patterns and processes
Publication type
Proceedings paper
Embargo date
9999-12-31
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