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Metal oxide EUV photoresist performance for N7 relevant patterns and processes

dc.contributor.authorStowers, Jason
dc.contributor.authorAnderson, Jeremy
dc.contributor.authorCardineau, Brian
dc.contributor.authorClark, Benjamin
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorEdson, Joseph
dc.contributor.authorGreer, Michael
dc.contributor.authorJiang, Kai
dc.contributor.authorKocsis, Michael
dc.contributor.authorMeyers, Stephen
dc.contributor.authorTelecky, Alan
dc.contributor.authorGrenville, Andrew
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorGillijns, Werner
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-23T15:15:52Z
dc.date.available2021-10-23T15:15:52Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27355
dc.sourceIIOimport
dc.titleMetal oxide EUV photoresist performance for N7 relevant patterns and processes
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorGreer, Michael
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage977904
dc.source.conferenceAdvances in Patterning Materials and Processes XXXIII
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2508776
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9779


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