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Density-balancing mask sssignment for via patterning with directed self-assembly

dc.contributor.authorTung, Maryann C.
dc.contributor.authorGuo, Daifeng
dc.contributor.authorKarageorgos, Ioannis
dc.contributor.authorWong, Martin D. F.
dc.contributor.authorWong, H.-S. Philip
dc.date.accessioned2021-10-23T15:42:04Z
dc.date.available2021-10-23T15:42:04Z
dc.date.issued2016-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27410
dc.sourceIIOimport
dc.titleDensity-balancing mask sssignment for via patterning with directed self-assembly
dc.typeMeeting abstract
dc.source.peerreviewno
dc.source.conference2nd International Symposium on DSA
dc.source.conferencedate11/10/2016
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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