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Conformal Cu electroless seed on Co and Ru liners enables Cu fill by plating for advanced interconnects
Publication:
Conformal Cu electroless seed on Co and Ru liners enables Cu fill by plating for advanced interconnects
Date
2016
Meeting abstract
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33687.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
van der Veen, Marleen
;
Inoue, Fumihiro
;
Vandersmissen, Kevin
;
Dictus, Dries
;
Tanaka, Tetsu
;
Boemmels, Juergen
;
Struyf, Herbert
;
Tokei, Zsolt
Journal
Abstract
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1910
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Acq. date: 2025-11-02
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Metrics
Views
1910
since deposited on 2021-10-23
3
last week
Acq. date: 2025-11-02
Citations