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Mask 3D effect mitigation by source optimization and assist feature placement

dc.contributor.authorVan Look, Lieve
dc.contributor.authorMochi, Iacopo
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorWittebrood, Friso
dc.contributor.authorLyakhova, Kateryna
dc.contributor.authorde Winter, Laurens
dc.contributor.authorLast, Thorsten
dc.contributor.authorFliervoet, Timon
dc.contributor.authorSchiffelers, Guido
dc.contributor.authorFinders, Jo
dc.contributor.authorVan Adrichem, Paul
dc.contributor.authorLyons, Adam
dc.contributor.authorLaenens, Bart
dc.contributor.authorLiddle, Jack
dc.contributor.authorNeumann, Jens Timo
dc.date.accessioned2021-10-23T16:13:01Z
dc.date.available2021-10-23T16:13:01Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27476
dc.sourceIIOimport
dc.titleMask 3D effect mitigation by source optimization and assist feature placement
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorLyakhova, Kateryna
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.imecauthorSchiffelers, Guido
dc.contributor.imecauthorVan Adrichem, Paul
dc.contributor.imecauthorLiddle, Jack
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate24/10/2016
dc.source.conferencelocationHiroshima Japan
imec.availabilityPublished - imec


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