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dc.contributor.authorVereecke, Guy
dc.contributor.authorDebruyn, Haroen
dc.contributor.authorXu, XiuMei
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-23T16:37:14Z
dc.date.available2021-10-23T16:37:14Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27523
dc.sourceIIOimport
dc.titleInfluence of CO2 gas atmosphere on the liquid filling of superhydrophobic nanostructures
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorDebruyn, Haroen
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage141
dc.source.endpage146
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke Belgium
dc.identifier.urlhttps://www.scientific.net/SSP.255.141
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 255


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