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Pattern collapse of high-aspect-ratio silicon nanostructures - A parametric study

dc.contributor.authorVrancken, Nandi
dc.contributor.authorVereecke, Guy
dc.contributor.authorBal, Stef
dc.contributor.authorSergeant, Stefanie
dc.contributor.authorDoumen, Geert
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorTerryn, Herman
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorXu, XiuMei
dc.date.accessioned2021-10-23T16:56:20Z
dc.date.available2021-10-23T16:56:20Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27559
dc.sourceIIOimport
dc.titlePattern collapse of high-aspect-ratio silicon nanostructures - A parametric study
dc.typeProceedings paper
dc.contributor.imecauthorVrancken, Nandi
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorSergeant, Stefanie
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorXu, XiuMei
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecSergeant, Stefanie::0000-0001-9923-0903
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.source.peerreviewyes
dc.source.beginpage136
dc.source.endpage140
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIII - UCPSS
dc.source.conferencedate11/09/2016
dc.source.conferencelocationKnokke-heist Belgium
dc.identifier.urlhttp://www.scientific.net/SSP.255.136
imec.availabilityPublished - imec


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