Authors
Wang, Fei;
Zhang, Pencheng;
Fang, Wei;
Liu, Kevin;
Jau, Jack;
Wang, Lester;
Wan, Alex;
Hunsche, Stefan;
Halder, Sandip;
Leray, Philippe
Conference
Metrology, Inspection, and Process Control for Microlithography XXX
Title
Process window and defect monitoring using high-throughput e-beam inspection guided by computational hot spot detection
Publication type
Proceedings paper
Embargo date
9999-12-31