dc.contributor.author | Wang, Fei | |
dc.contributor.author | Zhang, Pencheng | |
dc.contributor.author | Fang, Wei | |
dc.contributor.author | Liu, Kevin | |
dc.contributor.author | Jau, Jack | |
dc.contributor.author | Wang, Lester | |
dc.contributor.author | Wan, Alex | |
dc.contributor.author | Hunsche, Stefan | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Leray, Philippe | |
dc.date.accessioned | 2021-10-23T16:59:21Z | |
dc.date.available | 2021-10-23T16:59:21Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27565 | |
dc.source | IIOimport | |
dc.title | Process window and defect monitoring using high-throughput e-beam inspection guided by computational hot spot detection | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 97783F | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXX | |
dc.source.conferencedate | 20/02/2016 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2507366 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 9778 | |