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Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

dc.contributor.authorWood, Obert
dc.contributor.authorWong, Keith
dc.contributor.authorParks, Valentin
dc.contributor.authorKearney, Patrick
dc.contributor.authorMeyer-Ilse, Julia
dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorFaheem, Mohammad
dc.contributor.authorLiang, Yifan
dc.contributor.authorKumar, Ajay
dc.contributor.authorChen, Esther
dc.contributor.authorBennett, Corbin
dc.contributor.authorBianzhu, Fu
dc.contributor.authorGribelyuk, Michael
dc.contributor.authorZhao, Wayne
dc.contributor.authorMangat, Pawitter
dc.contributor.authorvan der Heide, Paul
dc.date.accessioned2021-10-23T17:16:26Z
dc.date.available2021-10-23T17:16:26Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27598
dc.sourceIIOimport
dc.titleImproved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
dc.typeProceedings paper
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage977619
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505797
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9776


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