Authors

Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Bianzhu, Fu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; van der Heide, Paul

Conference

Extreme Ultraviolet (EUV) Lithography

Title

Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

Publication type

Proceedings paper

Embargo date

9999-12-31