Publication:

Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

Date

2016
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorWood, Obert
dc.contributor.authorWong, Keith
dc.contributor.authorParks, Valentin
dc.contributor.authorKearney, Patrick
dc.contributor.authorMeyer-Ilse, Julia
dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorFaheem, Mohammad
dc.contributor.authorLiang, Yifan
dc.contributor.authorKumar, Ajay
dc.contributor.authorChen, Esther
dc.contributor.authorBennett, Corbin
dc.contributor.authorBianzhu, Fu
dc.contributor.authorGribelyuk, Michael
dc.contributor.authorZhao, Wayne
dc.contributor.authorMangat, Pawitter
dc.contributor.authorvan der Heide, Paul
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.accessioned2021-10-23T17:16:26Z
dc.date.available2021-10-23T17:16:26Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27598
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505797
dc.source.beginpage977619
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate21/02/2016
dc.source.conferencelocationSan Jose, CA USA
dc.title

Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
34649.pdf
Size:
4.66 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions