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Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
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Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
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Date
2016
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wood, Obert
;
Wong, Keith
;
Parks, Valentin
;
Kearney, Patrick
;
Meyer-Ilse, Julia
;
Luong, Vu
;
Philipsen, Vicky
;
Faheem, Mohammad
;
Liang, Yifan
;
Kumar, Ajay
;
Chen, Esther
;
Bennett, Corbin
;
Bianzhu, Fu
;
Gribelyuk, Michael
;
Zhao, Wayne
;
Mangat, Pawitter
;
van der Heide, Paul
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1902
since deposited on 2021-10-23
2
last month
Acq. date: 2025-12-11
Citations