Publication:
Evaluation of stress reduction in shallow trench isolation CMOS structures via synchrotron X-ray topography, Raman spectroscopy and electrical data
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1918 since deposited on 2021-10-01
2last month
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Acq. date: 2026-08-29
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1918 since deposited on 2021-10-01
2last month
1last week
Acq. date: 2026-08-29
Citations