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High-throughput magnetic metrology for spintronic CMOS integration

dc.contributor.authorYan, Jingdong
dc.contributor.authorManfrini, Mauricio
dc.contributor.authorRadisic, Dunja
dc.contributor.authorCiubotaru, Florin
dc.contributor.authorWilson, Chris
dc.contributor.authorRadu, Iuliana
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-23T17:27:54Z
dc.date.available2021-10-23T17:27:54Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27621
dc.sourceIIOimport
dc.titleHigh-throughput magnetic metrology for spintronic CMOS integration
dc.typeMeeting abstract
dc.contributor.imecauthorManfrini, Mauricio
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorCiubotaru, Florin
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecManfrini, Mauricio::0000-0003-3609-2042
dc.contributor.orcidimecCiubotaru, Florin::0000-0002-7088-2075
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec


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