Show simple item record

Quantitative modeling of H2O2 decomposition in SC1

dc.contributor.authorMertens, Paul
dc.contributor.authorBaeyens, Martien
dc.contributor.authorMoyaerts, Gert
dc.contributor.authorOkorn-Schmidt, H. F.
dc.contributor.authorVos, Rita
dc.contributor.authorDe Waele, Rita
dc.contributor.authorHatcher, Z.
dc.contributor.authorHub, W.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorKnotter, Martin
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-01T08:30:11Z
dc.date.available2021-10-01T08:30:11Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2762
dc.sourceIIOimport
dc.titleQuantitative modeling of H2O2 decomposition in SC1
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage176
dc.source.endpage183
dc.source.conferenceProceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate31/08/1997
dc.source.conferencelocationParis France
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 97-35


Files in this item

Thumbnail
Name:
2755.pdf
Size:
376.8Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record