Publication:

Process options to enable (Sub-)1e-9 Ohm.cm2 contact resistivity on Si devices

Date

2016
Proceedings Paper
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Author(s)

Yu, Hao  
;
Schaekers, Marc  
;
Demuynck, Steven  
;
Rosseel, Erik  
;
Everaert, Jean-Luc
;
Chew, Soon Aik
;
Peter, Antony  
;
Kubicek, Stefan  
;
Barla, Kathy  
;
Mocuta, Anda
;
Horiguchi, Naoto  
;
Collaert, Nadine  
;
Thean, Aaron  
;
De Meyer, Kristin  

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