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Ultralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation

dc.contributor.authorYu, Hao
dc.contributor.authorSchaekers, Marc
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorRosseel, Erik
dc.contributor.authorPeter, Antony
dc.contributor.authorHollar, K.
dc.contributor.authorKhaja, Fareen
dc.contributor.authorAderhold, W.
dc.contributor.authorDate, Lucien
dc.contributor.authorMayur, A.J.
dc.contributor.authorLee, J.G.
dc.contributor.authorShin, Keo Myoung
dc.contributor.authorDouhard, Bastien
dc.contributor.authorChew, Soon Aik
dc.contributor.authorDemuynck, Steven
dc.contributor.authorKubicek, Stefan
dc.contributor.authorKim, Daeyong
dc.contributor.authorMocuta, Anda
dc.contributor.authorBarla, Kathy
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-23T17:38:15Z
dc.date.available2021-10-23T17:38:15Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27640
dc.sourceIIOimport
dc.titleUltralow-resistivity CMOS contact scheme with pre-contact amorphization plus Ti (germano-)silicidation
dc.typeProceedings paper
dc.contributor.imecauthorYu, Hao
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorDate, Lucien
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorKubicek, Stefan
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecYu, Hao::0000-0002-1976-0259
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage66
dc.source.endpage67
dc.source.conferenceIEEE Symposium on VLSI Technology
dc.source.conferencedate13/06/2016
dc.source.conferencelocationHonolulu, HI USA
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=7573381
imec.availabilityPublished - open access


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