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The integration of low k hydrogen silsesquioxanes (HSQ) in sub 0.35µm processes

dc.contributor.authorMeynan, H.
dc.contributor.authorUttech, R.
dc.contributor.authorGao, Teng
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-01T08:30:18Z
dc.date.available2021-10-01T08:30:18Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2764
dc.sourceIIOimport
dc.titleThe integration of low k hydrogen silsesquioxanes (HSQ) in sub 0.35µm processes
dc.typeOral presentation
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.conference3rd International Symposium on Low and High Dielectric Constant Materials: Materials Science, Processing and Reliability Issues;
dc.source.conferencelocation
imec.availabilityPublished - imec


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