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Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node

dc.contributor.authorZarate Rincon, Fabian
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorCiofi, Ivan
dc.contributor.authorWilson, Chris
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorTorres, R.
dc.contributor.authorMurphy, R.S.
dc.date.accessioned2021-10-23T17:46:00Z
dc.date.available2021-10-23T17:46:00Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27654
dc.sourceIIOimport
dc.titlePitch walking assessment after self-aligned double patterning for the 10nm logic technology node
dc.typeMeeting abstract
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpagePD-04
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - open access


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