Publication:

Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node

Date

2016

Meeting abstract

Simple item page Full metadata Statistics

Files

34351.pdf 663.2 KB

Author(s)

Zarate Rincon, Fabian

;

Vega Gonzalez, Victor

;

;

;

van der Veen, Marleen

;

Roussel, Philippe

;

Boemmels, Juergen

;

;

;

Statistics

1873 since deposited on 2021-10-23

Acq. date: 2026-04-05