Publication:

Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node

Date

2016
Meeting abstract
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Author(s)

Zarate Rincon, Fabian
;
Vega Gonzalez, Victor  
;
Ciofi, Ivan  
;
Wilson, Chris  
;
van der Veen, Marleen  
;
Roussel, Philippe  
;
Boemmels, Juergen  
;
Tokei, Zsolt  
;
Torres, R.
;
Murphy, R.S.

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