Publication:
Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node
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1888 since deposited on 2021-10-23
6last month
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Acq. date: 2026-08-31
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Statistics
Views
1888 since deposited on 2021-10-23
6last month
2last week
Acq. date: 2026-08-31
Citations