Publication:

Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node

Date

2016
Meeting abstract
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dc.contributor.authorZarate Rincon, Fabian
dc.contributor.authorVega Gonzalez, Victor
dc.contributor.authorCiofi, Ivan
dc.contributor.authorWilson, Chris
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorRoussel, Philippe
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.contributor.authorTorres, R.
dc.contributor.authorMurphy, R.S.
dc.contributor.imecauthorVega Gonzalez, Victor
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorvan der Veen, Marleen
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecvan der Veen, Marleen::0000-0002-9402-8922
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.accessioned2021-10-23T17:46:00Z
dc.date.available2021-10-23T17:46:00Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27654
dc.source.beginpagePD-04
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate20/03/2016
dc.source.conferencelocationBrussels Belgium
dc.title

Pitch walking assessment after self-aligned double patterning for the 10nm logic technology node

dc.typeMeeting abstract
dspace.entity.typePublication
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