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Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas

dc.contributor.authorZotovich, Alexey
dc.contributor.authorEl Otell, Ziad
dc.contributor.authorSutton, Yvonne
dc.contributor.authorBraithwaite, N. St. J.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhail
dc.date.accessioned2021-10-23T17:59:49Z
dc.date.available2021-10-23T17:59:49Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27679
dc.sourceIIOimport
dc.titleUltra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
dc.typeMeeting abstract
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate9/05/2016
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - open access


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