dc.contributor.author | Zotovich, Alexey | |
dc.contributor.author | El Otell, Ziad | |
dc.contributor.author | Sutton, Yvonne | |
dc.contributor.author | Braithwaite, N. St. J. | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | Baklanov, Mikhail | |
dc.date.accessioned | 2021-10-23T17:59:49Z | |
dc.date.available | 2021-10-23T17:59:49Z | |
dc.date.issued | 2016 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/27679 | |
dc.source | IIOimport | |
dc.title | Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | El Otell, Ziad | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.conference | Plasma Etch and Strip in Microtechnology - PESM | |
dc.source.conferencedate | 9/05/2016 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - open access | |