Authors

Arimura, Hiroaki; Witters, Liesbeth; Cott, Daire; Dekkers, Harold; Loo, Roger; Mitard, Jerome; Ragnarsson, Lars-Ake; Wostyn, Kurt; Boccardi, Guillaume; Chiu, Eddie; Subirats, Alexandre; Favia, Paola; Vancoille, Eric; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine

Conference

Symposium on VLSI Technology

Title

Performance and electrostatic improvement by high-pressure anneal on Si-passivated strained Ge pFinFET and gate all around devices with superior NBTI reliability

Publication type

Proceedings paper