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Sequential infiltration synthesis for line edge roughness mitigation of EUV resist

dc.contributor.authorBaryshnikova, Marina
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorChan, BT
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorKachel, Krzysztof
dc.contributor.authorKnaepen, Werner
dc.contributor.authorMaes, Jan
dc.contributor.authorDe Roest, David
dc.date.accessioned2021-10-24T02:55:46Z
dc.date.available2021-10-24T02:55:46Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27806
dc.sourceIIOimport
dc.titleSequential infiltration synthesis for line edge roughness mitigation of EUV resist
dc.typeOral presentation
dc.contributor.imecauthorBaryshnikova, Marina
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorKnaepen, Werner
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorDe Roest, David
dc.contributor.orcidimecBaryshnikova, Marina::0000-0002-5945-4459
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference34th International Conference of Photopolymer Science and Technology
dc.source.conferencedate26/06/2017
dc.source.conferencelocationchiba Japan
imec.availabilityPublished - open access


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