Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform

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Authors
Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso
DOI
10.1117/12.2258005
Conference
Extreme Ultraviolet (EUV) Lithography VIII
Title
Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform
Publication type
Proceedings paper
Embargo date
9999-12-31
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