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Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform

dc.contributor.authorBlanco, Victor
dc.contributor.authorBekaert, Joost
dc.contributor.authorMao, Ming
dc.contributor.authorKutrzeba Kotowska, Bogumila
dc.contributor.authorLariviere, Stephane
dc.contributor.authorCiofi, Ivan
dc.contributor.authorBaert, Rogier
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorGallagher, Emily
dc.contributor.authorHendrickx, Eric
dc.contributor.authorTan, Ling Ee
dc.contributor.authorGillijns, Werner
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorLeray, Philippe
dc.contributor.authorHalder, Sandip
dc.contributor.authorGallagher, Matt
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPaolillo, Sara
dc.contributor.authorWan, Danny
dc.contributor.authorMallik, Arindam
dc.contributor.authorSherazi, Yasser
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorDusa, Mircea
dc.contributor.authorRusu, Paul
dc.contributor.authorHollink, Thijs
dc.contributor.authorFliervoet, Timon
dc.contributor.authorWittebrood, Friso
dc.date.accessioned2021-10-24T03:01:05Z
dc.date.available2021-10-24T03:01:05Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27862
dc.sourceIIOimport
dc.titleSingle exposure EUV patterning for BEOL metal layers on the imec iN7 platform
dc.typeProceedings paper
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorKutrzeba Kotowska, Bogumila
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorBaert, Rogier
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorGallagher, Emily
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorGallagher, Matt
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorWan, Danny
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecWan, Danny::0000-0003-4847-3184
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2258005
dc.source.peerreviewyes
dc.source.beginpage1014318
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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