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Process optimization and improvement of contact hole CDU and pattern placement with grapho-epitaxy DSA with EUV patterned templates

dc.contributor.authorBoeckx, Carolien
dc.date.accessioned2021-10-24T03:01:50Z
dc.date.available2021-10-24T03:01:50Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27869
dc.sourceIIOimport
dc.titleProcess optimization and improvement of contact hole CDU and pattern placement with grapho-epitaxy DSA with EUV patterned templates
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.conferenceElectron, Ion, and Photon Beam Technology and Nanofabrication
dc.source.conferencedate30/05/2017
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - imec


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