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Integration of the Sequential Infiltration Synthesis (SIS) on Polyphtaladehyde (PPA) resist for thermal Scanning Probe Lithography (t-SPL) patterning

dc.contributor.authorChan, BT
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorSpieser, Martin
dc.contributor.authorKnoll, Armin
dc.contributor.authorKnaepen, Werner
dc.date.accessioned2021-10-24T03:22:49Z
dc.date.available2021-10-24T03:22:49Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28000
dc.sourceIIOimport
dc.titleIntegration of the Sequential Infiltration Synthesis (SIS) on Polyphtaladehyde (PPA) resist for thermal Scanning Probe Lithography (t-SPL) patterning
dc.typeProceedings paper
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorKnaepen, Werner
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.conference43rd International Conference on Micro and Nanoengineering - MNE
dc.source.conferencedate18/09/2017
dc.source.conferencelocationBraga Portugal
imec.availabilityPublished - imec


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