Show simple item record

Effective use of aerial image metrology for calibration of OPC models

dc.contributor.authorChen, Ao
dc.contributor.authorFoong, Yee Mei
dc.contributor.authorThaler, Thomas
dc.contributor.authorButtgereit, Ute
dc.contributor.authorChung, Angeline
dc.contributor.authorBurbine, Andrew
dc.contributor.authorSturtevant, John
dc.contributor.authorClifford, Chris
dc.contributor.authorAdam, Kostas
dc.contributor.authorDe Bisschop, Peter
dc.date.accessioned2021-10-24T03:23:55Z
dc.date.available2021-10-24T03:23:55Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28006
dc.sourceIIOimport
dc.titleEffective use of aerial image metrology for calibration of OPC models
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2258632
dc.source.peerreviewyes
dc.source.beginpage101470Y
dc.source.conferenceOptical Microlithography XXX
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10147


Files in this item

Thumbnail
Name:
35393.pdf
Size:
1.639Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record