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Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorLyons, Adam
dc.contributor.authorRio, David
dc.contributor.authorLee, Sook
dc.contributor.authorDelorme, Maxence
dc.contributor.authorFumar-Pici, Anita
dc.contributor.authorKocsis, Michael
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorGreer, Michael
dc.contributor.authorWallow, THomas
dc.contributor.authorStowers, Jason K
dc.contributor.authorGillijns, Werner
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-24T03:55:56Z
dc.date.available2021-10-24T03:55:56Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28157
dc.sourceIIOimport
dc.titleCompact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorRio, David
dc.contributor.imecauthorKocsis, Michael
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorGreer, Michael
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2260441
dc.source.peerreviewyes
dc.source.beginpage101431E
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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