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EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorSanapala, Ravikumar
dc.contributor.authorAndrrew, Cross
dc.contributor.authorPreil, Moshe
dc.contributor.authorQian, Jin
dc.contributor.authorSumar, Shishir
dc.contributor.authorAnantha, Vidyasagar
dc.contributor.authorSah, Kaushik
dc.contributor.authorEitapence, Scott
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2021-10-24T03:56:12Z
dc.date.available2021-10-24T03:56:12Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28158
dc.sourceIIOimport
dc.titleEUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorSah, Kaushik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2281632
dc.source.peerreviewyes
dc.source.beginpage104510L
dc.source.conferencePhotomask Technology
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10451


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