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Exploring the readiness of EUV photo materials for patterning

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVesters, Yannick
dc.contributor.authorShehzad, Atif
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFoubert, Philippe
dc.contributor.authorBeral, Christophe
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorMao, Ming
dc.contributor.authorLazzarino, Frederic
dc.date.accessioned2021-10-24T03:56:55Z
dc.date.available2021-10-24T03:56:55Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28161
dc.sourceIIOimport
dc.titleExploring the readiness of EUV photo materials for patterning
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2258220
dc.source.peerreviewyes
dc.source.beginpage101430R
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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