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Nucleation mechanisms for chemical vapor deposition and atomic layer deposition of 2D semiconductor materials

dc.contributor.authorDelabie, Annelies
dc.contributor.authorZhang, Haodong
dc.contributor.authorvan Pelt, Thomas
dc.contributor.authorGroven, Benjamin
dc.contributor.authorHeyne, Markus
dc.contributor.authorTomczak, Yoann
dc.contributor.authorCaymax, Matty
dc.contributor.authorRadu, Iuliana
dc.date.accessioned2021-10-24T04:07:42Z
dc.date.available2021-10-24T04:07:42Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28205
dc.sourceIIOimport
dc.titleNucleation mechanisms for chemical vapor deposition and atomic layer deposition of 2D semiconductor materials
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorvan Pelt, Thomas
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecDelabie, Annelies::0000-0001-9739-7419
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceJoint EuroCVD-21 - BalticALD-15 Conference
dc.source.conferencedate11/06/2017
dc.source.conferencelocationLinköping Sweden
dc.identifier.urlhttp://eurocvd-balticald2017.se/onewebmedia/EuroCVD_2DMaterials_Delabie.pdf
imec.availabilityPublished - imec


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