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Local arrangement of substitutional C atoms and the thermal stability of epitaxial Si:C(P) grown by CVD
Publication:
Local arrangement of substitutional C atoms and the thermal stability of epitaxial Si:C(P) grown by CVD
Date
2017-11
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Dhayalan, Sathish Kumar
;
Nuytten, Thomas
;
Loo, Roger
;
Rosseel, Erik
;
Hikavyy, Andriy
;
Shimura, Yosuke
;
Vandervorst, Wilfried
Journal
ECS Journal of Solid State Science and Technology
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1894
since deposited on 2021-10-24
408
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Acq. date: 2025-10-24
Citations
Metrics
Views
1894
since deposited on 2021-10-24
408
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations