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Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

dc.contributor.authorDoise, Jan
dc.contributor.authorChan, BT
dc.contributor.authorHori, Masafumi
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-24T04:23:27Z
dc.date.available2021-10-24T04:23:27Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28265
dc.sourceIIOimport
dc.titleDual brush process for selective surface modification in graphoepitaxy directed self-assembly
dc.typeProceedings paper
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2259791
dc.source.peerreviewyes
dc.source.beginpage101460R
dc.source.conferenceAdvances in Patterning Materials and Processes XXXIV
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access


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