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Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
Publication:
Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications
Date
2017
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Florent, Karine
;
Lavizzari, Simone
;
Popovici, Mihaela Ioana
;
Di Piazza, Luca
;
Celano, Umberto
;
Groeseneken, Guido
;
Van Houdt, Jan
Journal
Journal of Applied Physics
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1938
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations
Metrics
Views
1938
since deposited on 2021-10-24
Acq. date: 2025-10-23
Citations