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Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance

dc.contributor.authorGao, Weimin
dc.contributor.authorBlanco, Victor
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKamohara, Itaru
dc.contributor.authorSaad, Yves
dc.contributor.authorCiofi, Ivan
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.contributor.authorKim, Ryan Ryoung han
dc.date.accessioned2021-10-24T04:55:09Z
dc.date.available2021-10-24T04:55:09Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28369
dc.sourceIIOimport
dc.titleModeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
dc.typeProceedings paper
dc.contributor.imecauthorGao, Weimin
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.identifier.doi10.1117/12.2259964
dc.source.peerreviewyes
dc.source.beginpage101430I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithograpgy VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10143


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