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Wafer-level nanoimprint lithography for single electron transistors

dc.contributor.authorGlinsner, Thomas
dc.contributor.authorEibelhuber, Martin
dc.contributor.authorTreiblmayr, Dominik
dc.contributor.authorSchamberger, Barbara
dc.contributor.authorChouiki, M.
dc.contributor.authorLenk, Claudia
dc.contributor.authorKrivoshapkina, Y.
dc.contributor.authorHoffmann, M.
dc.contributor.authorLenk, Steve
dc.contributor.authorRangelow, Ivo
dc.contributor.authorChan, BT
dc.contributor.authorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-24T05:06:11Z
dc.date.available2021-10-24T05:06:11Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28402
dc.sourceIIOimport
dc.titleWafer-level nanoimprint lithography for single electron transistors
dc.typeMeeting abstract
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewyes
dc.source.conference16th International Conference on Nanoimprint and Nanoprint Technology - NNT
dc.source.conferencedate8/11/2017
dc.source.conferencelocationChangwon Korea
imec.availabilityPublished - imec


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