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dc.contributor.authorGuissi, Sofiane
dc.contributor.authorClark, William
dc.contributor.authorJuncker, Aurélie
dc.contributor.authorErvin, J.
dc.contributor.authorGreiner, K.
dc.contributor.authorFried, D.
dc.contributor.authorBriggs, Basoene
dc.contributor.authorDevriendt, Katia
dc.contributor.authorSebaai, Farid
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorWilson, Chris
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-24T05:16:26Z
dc.date.available2021-10-24T05:16:26Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28431
dc.sourceIIOimport
dc.titleModeling of tone inversion process flow for N5 interconnect to characterize block tip to tip
dc.typeProceedings paper
dc.contributor.imecauthorGuissi, Sofiane
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage3
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate16/05/2017
dc.source.conferencelocationHsinchu Taiwan
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7968952/
imec.availabilityPublished - open access


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