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Vapour phase self-assembled monolayers for ALD blocking on 300 mm wafer scale

dc.contributor.authorHerregods, Sebastiaan
dc.contributor.authorLaurent, Lecordier
dc.contributor.authorVyas, Shashi
dc.contributor.authorChan, BT
dc.contributor.authorDelande, Tinne
dc.contributor.authorHetel, Iulian
dc.contributor.authorTokei, Zsolt
dc.contributor.authorStruyf, Herbert
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-24T05:38:34Z
dc.date.available2021-10-24T05:38:34Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28492
dc.sourceIIOimport
dc.titleVapour phase self-assembled monolayers for ALD blocking on 300 mm wafer scale
dc.typeMeeting abstract
dc.contributor.imecauthorHerregods, Sebastiaan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorHetel, Iulian
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecStruyf, Herbert::0000-0002-6782-5424
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceJoint EuroCVD 21 - Baltic ALD 15
dc.source.conferencedate11/06/2017
dc.source.conferencelocationLinköping Sweden
imec.availabilityPublished - imec


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