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Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts
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Authors
Heyne, Markus
;
Goodyear, Andy
;
de Marneffe, Jean-Francois
;
Cooke, Mike
;
Neyts, Erik C.
;
Radu, Iuliana
;
De Gendt, Stefan
Conference
10th Plasma Etch and Strip for Microtechnology Workshop - PESM
Title
Atomic layer etching of amorphous silicon with selectivity towards MoS2 for novel MX2 heterostructure device concepts
Publication type
Proceedings paper
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