Show simple item record

Atomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures

dc.contributor.authorHeyne, Markus
dc.contributor.authorGoodyear, Andy
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorCooke, Mike
dc.contributor.authorNeyts, Erik
dc.contributor.authorRadu, Iuliana
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-24T05:43:43Z
dc.date.available2021-10-24T05:43:43Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28506
dc.sourceIIOimport
dc.titleAtomic layer etching of amorphous Si on MoS2 for selectively patterned MX2 heterostructures
dc.typeProceedings paper
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.conferenceiPlasmaNano-VIII
dc.source.conferencedate2/07/2017
dc.source.conferencelocationAntwerp Belgium
dc.identifier.urlhttp://www.iplasmanano.org/files/iPlasmaNano_VIII_Programme-LS.pdf?v=4
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record