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Challenges and progresses in high-k metal gate for Silicon-based advanced CMOS transistor architecture

dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorMertens, Hans
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorFranco, Jacopo
dc.contributor.authorSchram, Tom
dc.contributor.authorDekkers, Harold
dc.contributor.authorBarla, Kathy
dc.contributor.authorMocuta, Dan
dc.date.accessioned2021-10-24T05:50:05Z
dc.date.available2021-10-24T05:50:05Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28522
dc.sourceIIOimport
dc.titleChallenges and progresses in high-k metal gate for Silicon-based advanced CMOS transistor architecture
dc.typeProceedings paper
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorFranco, Jacopo
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorBarla, Kathy
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecFranco, Jacopo::0000-0002-7382-8605
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.source.peerreviewyes
dc.source.beginpage102
dc.source.endpage103
dc.source.conferenceInternational Workshop on Dielectric Thin Films
dc.source.conferencedate20/11/2017
dc.source.conferencelocationNara Japan
imec.availabilityPublished - imec


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