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Impact of acid statistics on EUV local critical dimension uniformity

dc.contributor.authorJiang, Jing
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorYildirim, Oktay
dc.contributor.authorMeeuwissen, Marieke
dc.contributor.authorHoefnagels, Rik
dc.contributor.authorRispens, Gijs
dc.contributor.authorDerks, Paul
dc.contributor.authorCusters, Rolf
dc.date.accessioned2021-10-24T06:22:53Z
dc.date.available2021-10-24T06:22:53Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28605
dc.sourceIIOimport
dc.titleImpact of acid statistics on EUV local critical dimension uniformity
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorYildirim, Oktay
dc.contributor.imecauthorMeeuwissen, Marieke
dc.contributor.imecauthorHoefnagels, Rik
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257903
dc.source.peerreviewyes
dc.source.beginpage1014323
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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